Yamashita, Keiji published the artcilePreparation of photoresist polymer by a photoreactive monomer containing N,N-diethyldithiocarbamate group, Application of Benzyl diethylcarbamodithioate, the publication is Journal of Applied Polymer Science (1988), 35(2), 465-73, database is CAplus.
p-Et2NCS2CH2C6H4CH:CH2 (I) was synthesized and copolymerized with styrene, Me methacrylate, acrylonitrile, and vinyl acetate by AIBN initiation. The copolymers obtained had efficient photocrosslinking abilities, and were thermally stable. Therefore, there was no loss of dithiocarbamoyl group during radical polymerization, and the polymerization proceeded through vinyl groups. The degree of UV photocrosslinking was proportional to the concentration of the photosensitive group, but photosensitivity of the polymer was not. Water-soluble photoreactive copolymers of I with acrylamide (II) and methacrylic acid were also prepared I–II copolymer had good photosensitivity at only 3 mol% I incorporation. Photocrosslinking yields of these polymers depends on the viscosity of the original polymers except in the case of low concentration of I. The relation between copolymer composition and glass transition temperature (Tg) was also investigated. Investigation of Tg, showed that the copolymer structure largely affected the ΔTg. The mechanism of photocrosslinking was studied by photodecomposition of benzyl N,N-diethyldithiocarbamate, and the decreases of sulfur content was clearly related to photocrosslinking points.
Journal of Applied Polymer Science published new progress about 3052-61-7. 3052-61-7 belongs to esters-buliding-blocks, auxiliary class Amine,Benzene,Amide, name is Benzyl diethylcarbamodithioate, and the molecular formula is C8H10BNO3, Application of Benzyl diethylcarbamodithioate.
Referemce:
https://en.wikipedia.org/wiki/Ester,
Ester – an overview | ScienceDirect Topics