Category: 14481-08-4

Category: esters-buliding-blocks. The mechanism of aromatic electrophilic substitution of aromatic heterocycles is consistent with that of benzene. Compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), is researched, Molecular C22H38NiO4, CAS is 14481-08-4, about MOCVD of thin mixed-conducting films on porous ceramic substrates. Author is Stiens, Dirk; Wahl, Georg; Garcia, Gemma; Van Veen, Andre; Rebeilleau, Michael.

Dense layers of La nickelate were deposited by MOCVD on tubular porous ceramic substrates (100 mm length, 10 mm outer diameter, 110 nm pore size). Initial room temperature N leak rates of the layers of ≈18 μm thickness were as low as 7 × 10-8 mol s-1 cm-2 at Δp = 0.5 bar. Uniform film composition and thickness over the entire substrate length was verified by cross-sectional SEM and EDX anal. XRD anal. showed that the deposited material obtained at 480° is amorphous. Annealing at 800° lead to formation of a mixture of La2NiO4 and LaNiO3 phases.

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Electric Literature of C22H38NiO4. The protonation of heteroatoms in aromatic heterocycles can be divided into two categories: lone pairs of electrons are in the aromatic ring conjugated system; and lone pairs of electrons do not participate. Compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), is researched, Molecular C22H38NiO4, CAS is 14481-08-4, about Catalyst enhanced chemical vapor deposition of nano-particle nickel films on Teflon surface. Author is Liu, Endong; Feng, Wenfang; Zhou, Jinlan; Yu, Kaichao.

Films formed with nanosized nickel particles on teflon surface were prepared by means of catalyst enhanced chem. vapor deposition (CECVD) with Ni(dmg)2, Ni(acac)2, Ni(hfac)2, Ni(TMHD)2, and Ni(cp)2 as precursors, and complexes Pd(hfac)2, PdCl2, and Pd(η3-2-methylallyl)acac as catalyst under carrier gas (H2). The film growth rate depends on the precursors and substrate temperature The chem. value, purity and surface morphol. of the Ni particle films were characterized by XPS and SEM. The films obtained were shiny with silvery color, and consisted of grains with a particle size of 50-140 nm. The Ni was metallic of which the purity was about 90-95% from XPS anal. SEM micrograph showed that the film had good morphol.

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Most of the compounds have physiologically active properties, and their biological properties are often attributed to the heteroatoms contained in their molecules, and most of these heteroatoms also appear in cyclic structures. A Journal, Topics in Catalysis called Nickel Supported on Mesoporous Zirconium Oxide by Atomic Layer Deposition: Initial Fixed-Bed Reactor Study, Author is Voigt, Pauline; Haimi, Eero; Lahtinen, Jouko; Cheah, You Wayne; Makela, Eveliina; Viinikainen, Tiia; Puurunen, Riikka L., which mentions a compound: 14481-08-4, SMILESS is CC(C)(C1=O[Ni+2]2(O=C(C(C)(C)C)[CH-]1)O=C([CH-]C(C(C)(C)C)=O2)C(C)(C)C)C, Molecular C22H38NiO4, COA of Formula: C22H38NiO4.

Atomic layer deposition (ALD) is gaining attention as a catalyst preparation method able to produce metal (oxide, sulfide, etc.) nanoparticles of uniform size down to single atoms. This work reports our initial experiments to support nickel on mesoporous zirconia. Nickel (2,2,6,6-tetramethyl-3,5-heptanedionate)2 [Ni(thd)2] was reacted in a fixed-bed ALD reactor with zirconia, characterised with BET surface area of 72 m2/g and mean pore size of 14 nm. According to x-ray fluorescence measurements, the average nickel loading on the top part of the support bed was on the order of 1%, corresponding to circa one nickel atom per square nanometer. Cross-sectional SEM combined with energy-dispersive spectroscopy confirmed that in the top part of the fixed support bed, nickel was distributed throughout the zirconia particles. XPS indicated the nickel oxidation state to be two. Organic thd ligands remained complete on the surface after the Ni(thd)2 reaction with zirconia, as followed with diffuse reflectance IR Fourier transform spectroscopy. The ligands could be fully removed by oxidation at 400°. Nickel catalysts on zirconia can likely be made by ALD. Before catalytic testing, in addition to increasing the nickel loading by repeated ALD cycles, optimization of the process parameters is required to ensure uniform distribution of nickel throughout the support bed and within the zirconia particles.

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Nilsen, O.; Fjellvag, H.; Kjekshus, A. published an article about the compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II)( cas:14481-08-4,SMILESS:CC(C)(C1=O[Ni+2]2(O=C(C(C)(C)C)[CH-]1)O=C([CH-]C(C(C)(C)C)=O2)C(C)(C)C)C ).Computed Properties of C22H38NiO4. Aromatic heterocyclic compounds can be classified according to the number of heteroatoms or the size of the ring. The authors also want to convey more information about this compound (cas:14481-08-4) through the article.

The utility of precursors for at. layer CVD (ALCVD) growth is limited by the sublimation and decomposition temperatures Sublimation temperatures are conveniently obtained by TG under vacuum. The authors present here a relatively inexpensive method to obtain information about the decomposition temperature for a precursor candidate for ALCVD. This approach requires an oven with a controlled temperature gradient and a long ampul for each precursor. The precursors tested comprise the thd complexes (Hthd = 2,2,6,6-tetramethylheptane-3,5-dione) of V, Cr, Mn, Fe, Co, Ni, Cu, Zn, La, and Ca.

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Product Details of 14481-08-4. So far, in addition to halogen atoms, other non-metallic atoms can become part of the aromatic heterocycle, and the target ring system is still aromatic. Compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), is researched, Molecular C22H38NiO4, CAS is 14481-08-4, about Molecular characterization of nickel and vanadium nonporphyrin compounds found in heavy crude petroleums and bitumens.

Electron impact mass spectroscopy (EIMS) anal. of the fractions of pyridine/water extracts of selected crude petroleums, separated by HPLC indicated V porphyrins in Cerro Negro and Wilmington moderate polar fractions and possibly in the Wilmington low polar fraction. The EIMS results provided no addnl. information on the metallo-nonporphyrins. Further purification of the highly polar fraction of the Wilmington crude petroleum extract showed the bonding for ≥1 type of Ni-containing nonporphyrin compound This Ni is bound as carboxylates. HPLC anal. of gilsonite (bitumen) indicated that the Ni is predominantly bound as metallopetroporphyrin, while a small portion eluted as a highly polar metallo-nonporphyrin fraction.

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Cotton, F. Albert; Harris, Charles Bonner; Wise, John J. published an article about the compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II)( cas:14481-08-4,SMILESS:CC(C)(C1=O[Ni+2]2(O=C(C(C)(C)C)[CH-]1)O=C([CH-]C(C(C)(C)C)=O2)C(C)(C)C)C ).Product Details of 14481-08-4. Aromatic heterocyclic compounds can be classified according to the number of heteroatoms or the size of the ring. The authors also want to convey more information about this compound (cas:14481-08-4) through the article.

Extended Hueckel-type M.O. calculations were carried out on bis(β-ketoenolate) complexes of Cu(II) and Ni(II), taking these as planar mols. of D2h symmetry, with the ring substituents as H atoms (to limit the size of the basis set of at. orbitals). The Wolfsberg-Helmholz approximation was used to estimate off-diagonal matrix elements. The diagonal matrix elements for the metal orbitals were estimated by the Ros procedure in which valence state ionization potentials are corrected (substantially) for the influence of the ligand atoms. The coefficient of the dxy orbital in 1 of the M.O.’s was constrained to have a value similar to that indicated by E.S.R. data by adjustment of the Hii terms of the O atoms. The results of the calculation are in good agreement with E.S.R. data and the visible spectra and are useful in interpreting uv spectra. 28 references.

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Safety of Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II). The fused heterocycle is formed by combining a benzene ring with a single heterocycle, or two or more single heterocycles. Compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), is researched, Molecular C22H38NiO4, CAS is 14481-08-4, about Deposition of CeO2 and NiO buffer layers for YBCO coated conductors on biaxially textured Ni substrates by a MOCVD technique. Author is Kim, Chang-Joong; Kim, Ho-Jin; Sun, Jong-Won; Ji, Bong Ki; Kim, Hyoung-Seop; Joo, Jinho; Jun, Byung-Hyuk; Jung, Choong-Hwan; Park, Soon-Dong; Park, Hai-Woong; Hong, Gye-Won.

CeO2 and NiO buffers for YBCO coated conductors were deposited on biaxially textured Ni substrates by a metalorganic CVD method. The degree of texture and surface roughness of the oxide films were analyzed by x-ray pole figure, at. force microscope (AFM) and SEM. The texture of deposited CeO2 films was a function of deposition temperature and O partial pressure (PO2). The (2 0 0) texture of CeO2 was fully developed at T = 500-520° and PO2 = 3.33 torr. The growth rate of the CeO2 films was 200 nm/min at T = 520° and PO2 = 2.30 torr, which is much faster than those prepared by other phys. deposition methods. The (2 0 0) texture of NiO was formed at T = 450° and PO2 = 1.67 torr. The full width half maximum of the both films was in the range of 8-10°. The AFM surface roughness of the films was between 3.0-10 nm, depending on the deposition temperature

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Quality Control of Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II). The protonation of heteroatoms in aromatic heterocycles can be divided into two categories: lone pairs of electrons are in the aromatic ring conjugated system; and lone pairs of electrons do not participate. Compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), is researched, Molecular C22H38NiO4, CAS is 14481-08-4, about Film microstructure-deposition condition relationships in the growth of epitaxial NiO films by metalorganic chemical vapor deposition on oxide and metal substrates. Author is Wang, Anchuan; Belot, Ohn A.; Marks, Tobin J..

High-quality epitaxial or highly textured NiO thin films can be grown at temperatures of 400-750 °C by low-pressure metalorganic chem. vapor deposition (MOCVD) on MgO, SrTiO3, C-cut sapphire, as well as on single crystal and highly textured Ni (200) metal substrates using Ni(dpm)2 (dpm = dipivaloylmethanate) as the volatile precursor and O2 or H2O as the oxidizer/protonolyzer. X-ray diffraction (XRD), SEM/energy dispersive detection (SEM/EDX), and at. force microscopy (AFM) confirm that the O2-derived NiO films are smooth and that the quality of the epitaxy can be improved by decreasing the growth temperature and/or the precursor flow rate. However, low growth temperatures (400-500 °C) lead to rougher surfaces and carbon contamination. The H2O-derived NiO films, which can be obtained only at relatively high temperatures (650-750 °C), exhibit slightly broader w scan full width half-maximum (FWHM) values and rougher surfaces but no carbon contamination. Using H2O as the oxidizer/protonolyzer, smooth and highly textured NiO (111) films can be grown on easily oxidized single crystal and highly textured Ni (200) metal substrates, which is impossible when O2 is the oxidizer. The textural quality of these films depends on both the quality of the metal substrates and the gaseous precursor flow rate.

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In organic chemistry, atoms other than carbon and hydrogen are generally referred to as heteroatoms. The most common heteroatoms are nitrogen, oxygen and sulfur. Now I present to you an article called Crystal engineering: synthesis and structural analysis of coordination polymers with wavelike properties, published in 2011-12-31, which mentions a compound: 14481-08-4, mainly applied to transition metal beta diketonate coordination polymer preparation crystal structure, Related Products of 14481-08-4.

Supramol. coordination polymers with wavelike structures were synthesized by self-assembly and their structures analyzed using the sine trigonometric function. Slow evaporation of a methylene chloride-methanol solution of a 1:1 M mixture of [M(tmhd)2], where M = Co or Ni, and quinoxaline; a 1:2:1 M mixture of [M(acac)2], where M = Co or Ni, 2,2,6,6-tetramethyl-3,5-heptadione and quinoxaline; or a 1:2:1 M mixture of [Co(acac)2], dibenzoylmethane, and quinoxaline, yielded the crystalline coordination polymers. In the presence of the nitrogenous base, ligand scrambling occurs yielding the most insoluble product. The synthesis and structures of the following wavelike polymers are reported: trans-[Co(DBM)2(qox)]n·nH2O (2), trans-[Co(tmhd)2(qox)]n (3), trans-[Ni(tmhd)2(qox)]n (4), where DBM- = dibenzoylmethanate, tmhd- = 2,2,6,6-tetramethyl-3,5-heptadionate, and qox = quinoxaline. The wavelike structures were generated by intramol. steric interactions and crystal packing forces between the chains. Some of the tert-Bu groups show a two-fold disorder. The sine function, φ = A sin 2πx/λ, where φ = distance (Å) along the polymer backbone, λ = wavelength (Å), A = amplitude (Å), x = distance (Å) along the polymer axis, provides a method to approx. and visualize the polymer structures.

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Application In Synthesis of Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II). The fused heterocycle is formed by combining a benzene ring with a single heterocycle, or two or more single heterocycles. Compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), is researched, Molecular C22H38NiO4, CAS is 14481-08-4, about Growth and stability of CVD Ni3N and ALD NiO dual layers. Author is Lindahl, Erik; Ottosson, Mikael; Carlsson, Jan-Otto.

Multilayers of combinations of NiO, Ni3N, and Ni were grown by ALD and CVD techniques at 250°. Layers of low thermodynamical stability were modified to reach the target structures. The Ni layers were formed by decomposition of metastable Ni3N layers, i.e., the Ni3N layers act as precursor for Ni film growth. This new reaction route enables production of Ni/NiO layer structures by chem. means for the first time. By choosing suitable low temperature annealing conditions like 180 °C in a 1 Torr hydrogen atm., good control of the interfaces is obtained. It is possible to grow multilayers which are ordered both with respect to each other, the substrate and the Ni films. For instance the following structure Ni (111)/NiO (111)/α-Al2O3 (00l) was grown. Moreover, another new reaction route is deposition of thin epitaxial seed layers of NiO (111) for subsequent growth of Ni3N at a high rate. Single phase Ni(111) films could then be obtained by decomposition at 350° of the Ni3N layers. The demonstrated reaction routes for film growth in the Ni-O-N system can also be applied in several similar systems.

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