Heterocyclic compounds can be divided into two categories: alicyclic heterocycles and aromatic heterocycles. Compounds whose heterocycles in the molecular skeleton cannot reflect aromaticity are called alicyclic heterocyclic compounds. Compound: 14481-08-4, is researched, Molecular C22H38NiO4, about Atomic Layer Deposition of NiO by the Ni(thd)2/H2O Precursor Combination, the main research direction is bistetramethylheptane dionatonickel water nickel oxide atomic layer deposition.Recommanded Product: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II).
Polycrystalline nickel oxide is deposited on SiO2 substrates by alternating pulses of bis(2,2,6,6-tetramethylheptane-3,5-dionato)nickel(II) (Ni(thd)2) and H2O. The deposition process shows at. layer deposition (ALD) characteristics with respect to the saturation behavior of the two precursors at deposition temperatures up to 275 °C. The growth of nickel oxide is shown to be highly dependent on surface hydroxide groups, and a large excess of H2O is required to achieve saturation Throughout the deposition temperature range the amount of carbon in the film, originating from the metal precursor ligand, is in the range 1-2%. Above 275 °C ALD growth behavior is lost in favor of thermal decomposition of the metal precursor. The initial nucleation process is studied by at. force microscopy (AFM) and reveals nucleation of well-separated grains which coalesce to a continuous film after about 250 ALD cycles.
This compound(Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II))Recommanded Product: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II) was discussed at the molecular level, the effects of temperature and reaction time on the properties of the compound were discussed, and the optimum reaction conditions were selected.
Reference:
Ester – Wikipedia,
Ester – an overview | ScienceDirect Topics