Safety of Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II). The fused heterocycle is formed by combining a benzene ring with a single heterocycle, or two or more single heterocycles. Compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), is researched, Molecular C22H38NiO4, CAS is 14481-08-4, about Deposition of CeO2 and NiO buffer layers for YBCO coated conductors on biaxially textured Ni substrates by a MOCVD technique. Author is Kim, Chang-Joong; Kim, Ho-Jin; Sun, Jong-Won; Ji, Bong Ki; Kim, Hyoung-Seop; Joo, Jinho; Jun, Byung-Hyuk; Jung, Choong-Hwan; Park, Soon-Dong; Park, Hai-Woong; Hong, Gye-Won.
CeO2 and NiO buffers for YBCO coated conductors were deposited on biaxially textured Ni substrates by a metalorganic CVD method. The degree of texture and surface roughness of the oxide films were analyzed by x-ray pole figure, at. force microscope (AFM) and SEM. The texture of deposited CeO2 films was a function of deposition temperature and O partial pressure (PO2). The (2 0 0) texture of CeO2 was fully developed at T = 500-520° and PO2 = 3.33 torr. The growth rate of the CeO2 films was 200 nm/min at T = 520° and PO2 = 2.30 torr, which is much faster than those prepared by other phys. deposition methods. The (2 0 0) texture of NiO was formed at T = 450° and PO2 = 1.67 torr. The full width half maximum of the both films was in the range of 8-10°. The AFM surface roughness of the films was between 3.0-10 nm, depending on the deposition temperature
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