Hsu, Shih-Hsin published the artcileHigh-Speed One-Photon 3D Nanolithography Using Controlled Initiator Depletion and Inhibitor Transport, Product Details of C15H20O6, the publication is Advanced Optical Materials (2022), 10(4), 2102262, database is CAplus.
Additive manufacturing of sophisticated 3D nanoscale objects commonly uses femtosecond lasers to photopolymerize a light-sensitive resin using multi-photon absorption. This nonlinear process provides high accuracy and flexibility in advanced 3D fabrication; however, it typically has limited throughput and high cost. This work makes use of a one-photon-based dosage-nonlinearity to fabricate 3D nanostructures, demonstrating a cost-effective method for 3D nanolithog. using a low-cost 405 nm continuous-wave diode laser. This dosage-nonlinearity is achieved by using controlled depletion of photo-initiation species in an environment containing inhibiting species. By controlling multiple competing processes, the undesired dose accumulation outside the writing voxel is stopped, and thereby this method creates a confined writing voxel in space. A multiphysics model is developed to numerically study the one-photon nonlinear photopolymerization process, which is compared with exptl. results.
Advanced Optical Materials published new progress about 15625-89-5. 15625-89-5 belongs to esters-buliding-blocks, auxiliary class Polymerization Reagents,Crosslinkers, name is Trimethylolpropane triacrylate, and the molecular formula is C15H20O6, Product Details of C15H20O6.
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https://en.wikipedia.org/wiki/Ester,
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