Yamashita, Keiji published the artcilePreparation of photoresist polymer by a photoreactive monomer containing N,N-diethyldithiocarbamate group, Computed Properties of 3052-61-7, the publication is Journal of Applied Polymer Science (1988), 35(2), 465-73, database is CAplus.
The title monomer, 4-vinylbenzyl diethyldithiocarbamate (I), was synthesized and copolymerized with some vinyl monomers by AIBN. The copolymers obtained had efficient photocrosslinking abilities, and were thermally stable. There was no loss of the dithiocarbamoyl group during radical polymerization, and the polymerization proceeded through the vinyl group. The degree of photocrosslinking was proportional to the concentration of the photosensitive group, but the photosensitivity of the polymer was not. Water-soluble photoreactive copolymers, of I with acrylamide (II) or methacrylic acid were also prepared The I–II copolymer had good photosensitivity at 3% I incorporation. Photocrosslinking yields of these polymers depended on the viscosity of the original polymers except for low I amounts The relation between copolymer composition and glass transition temperature (Tg) indicated that the copolymer structure largely depended on ΔTg. The mechanism of photocrosslinking was studied by photodecomposition of benzyl diethyldithiocarbamate, showing that decreases of S content were clearly related to the photocrosslinking points.
Journal of Applied Polymer Science published new progress about 3052-61-7. 3052-61-7 belongs to esters-buliding-blocks, auxiliary class Amine,Benzene,Amide, name is Benzyl diethylcarbamodithioate, and the molecular formula is C7H3BrF3I, Computed Properties of 3052-61-7.
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https://en.wikipedia.org/wiki/Ester,
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