Toriumi, Minoru et al. published their research in Proceedings of SPIE-The International Society for Optical Engineering in 2003 | CAS: 3063-94-3

1,1,1,3,3,3-Hexafluoroisopropylmethacrylate (cas: 3063-94-3) belongs to esters. Esters typically have a pleasant smell; those of low molecular weight are commonly used as fragrances and are found in essential oils and pheromones. Liquid esters of low volatility serve as softening agents for resins and plastics. Esters also include many industrially important polymers. Polymethyl methacrylate is a glass substitute sold under the names Lucite and Plexiglas; polyethylene terephthalate is used as a film (Mylar) and as textile fibres sold as Terylene, Fortrel, and Dacron.Formula: C7H6F6O2

Novel main-chain-fluorinated polymers for 157-nm photoresists was written by Toriumi, Minoru;Koh, Meiten;Ishikawa, Takuji;Kodani, T.;Araki, Takayuki;Aoyama, Hirokazu;Yamashita, Tsuneo;Yamazaki, Tamio;Furukawa, Takamitsu;Itani, Toshiro. And the article was included in Proceedings of SPIE-The International Society for Optical Engineering in 2003.Formula: C7H6F6O2 The following contents are mentioned in the article:

Main-chain-fluorinated base-resins, including tetrafluoroethylene and norbornene derivatives, were synthesized and their fundamental properties, such as transparency at 157 nm and solubility in a standard alk. developer, were characterized. A high transparency, i.e., absorbance of less then 0.5 μm-1, was achieved by optimizing the polymerization conditions with a variety of counter monomers. It was found that the polymerization conditions could also control the dissolution rates of the fluoropolymers and increased the dissolution rate of unprotected fluoropolymers by about three orders of magnitude, which was sufficient for the alk. developability. Pos.-working resists based on fluororesins were developed and showed good transparency of less than 1 μm-1 at 157 nm, and good solubility in a standard alk. solution of 0.26-N tetramethylammonium (without any swelling behavior). And an acceptable etching rate as resistant as ArF resists was obtained and 65-nm dense lines could be delineated by the exposure at 157-nm wavelength. This study involved multiple reactions and reactants, such as 1,1,1,3,3,3-Hexafluoroisopropylmethacrylate (cas: 3063-94-3Formula: C7H6F6O2).

1,1,1,3,3,3-Hexafluoroisopropylmethacrylate (cas: 3063-94-3) belongs to esters. Esters typically have a pleasant smell; those of low molecular weight are commonly used as fragrances and are found in essential oils and pheromones. Liquid esters of low volatility serve as softening agents for resins and plastics. Esters also include many industrially important polymers. Polymethyl methacrylate is a glass substitute sold under the names Lucite and Plexiglas; polyethylene terephthalate is used as a film (Mylar) and as textile fibres sold as Terylene, Fortrel, and Dacron.Formula: C7H6F6O2

Referemce:
Ester – Wikipedia,
Ester – an overview | ScienceDirect Topics