Zhao, Hui; Gu, Weiyin; Thielke, Michael W.; Sterner, Elizabeth; Tsai, Tsunghan; Russell, Thomas P.; Coughlin, E. Bryan; Theato, Patrick published the artcile< Functionalized Nanoporous Thin Films and Fibers from Photocleavable Block Copolymers Featuring Activated Esters>, Application In Synthesis of 71195-85-2, the main research area is nanoporous thin film RAFT polymerization contact angle.
A series of poly(pentafluorophenyl (methyl)acrylates)-block-poly(ethylene oxide) with o-nitrobenzyl ester photocleavable junctions (PPFP(M)A-hv-PEO) were synthesized by RAFT polymerization The block copolymers were used to fabricate thin films and fibers by spin-coating and electrospinning, resp. After solvent annealing, UV exposure, and washing with methanol/water to remove the minor PEO block, nanoporous structures were obtained. Both the porous thin films and fibers remained reactive to amine substitution of the pentafluorophenyl esters under mild conditions, which was confirmed by XPS, fluorescence confocal microscopy, FT-IR, and contact angle measurements.
Macromolecules (Washington, DC, United States) published new progress about Azide-alkyne 1,3-dipolar cycloaddition reaction. 71195-85-2 belongs to class esters-buliding-blocks, and the molecular formula is C9H3F5O2, Application In Synthesis of 71195-85-2.
Referemce:
Ester – Wikipedia,
Ester – an overview | ScienceDirect Topics