Safety of Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II). The reaction of aromatic heterocyclic molecules with protons is called protonation. Aromatic heterocycles are more basic than benzene due to the participation of heteroatoms. Compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), is researched, Molecular C22H38NiO4, CAS is 14481-08-4, about Synthesis of undoped and Ni doped InTaO4 photoactive thin films by metal organic chemical vapor deposition. Author is McSporran, N.; Rico, V.; Borras, A.; Gonzalez-Elipe, A. R.; Sauthier, G.; Gyoergy, E.; Santiso, J.; Garcia, G.; Figueras, A.; Parafianovic, L.; Abrutis, A..
Indium tantalate (InTaO4) and nickel doped InTaO4, In1-xNixTaO4 (x = 0.1), thin films were grown by Pulsed Injection Metal Organic Chem. Vapor Deposition (PI-MOCVD). The deposition was carried out using as precursors a solution of Ta(OC2H5)5 and In(THD)3 in toluene for the InTaO4 and Ta(OC2H5)5, In(THD)3 and Ni(THD)2 in toluene for the In1-xNixTaO4 thin films. The compounds formation, films stoichiometry and crystalline structure were studied as a function of substrate temperature and precursors concentration Crystalline and stoichiometric (indium/tantalum at. ratio of 1) films were obtained under optimized deposition conditions. Post-deposition heat treatment in N2 or O2 atmospheres further improved the crystalline quality of the films. Under optimum growth conditions the films showed no phase segregations, a feature that makes them suitable for future photocatalytic applications. The study of hydrophilic activities of In1-xNixTaO4 thin films evidenced a decrease of the water contact angle up to 60° under visible light irradiation and a complete transformation in a superhydrophilic state upon UV irradiation
《Synthesis of undoped and Ni doped InTaO4 photoactive thin films by metal organic chemical vapor deposition》 provides a strategy for the preparation of materials with excellent comprehensive properties, which is conducive to broaden the application field of this compound(Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II))Safety of Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II).
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