Awesome and Easy Science Experiments about 14481-08-4

《Chemical vapour deposition of metastable Ni3N》 provides a strategy for the preparation of materials with excellent comprehensive properties, which is conducive to broaden the application field of this compound(Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II))SDS of cas: 14481-08-4.

In general, if the atoms that make up the ring contain heteroatoms, such rings become heterocycles, and organic compounds containing heterocycles are called heterocyclic compounds. An article called Chemical vapour deposition of metastable Ni3N, published in 2009, which mentions a compound: 14481-08-4, Name is Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II), Molecular C22H38NiO4, SDS of cas: 14481-08-4.

Metastable nickel nitride (Ni3N) was chem. vapor deposited using bis(2,2,6,6-tetramethyl-3,5-heptanedionato)Ni(II) (Ni(thd)2) and ammonia precursors. The growth on both nonetched Si(100) and amorphous SiO2 is polycrystalline at deposition temperatures between 200-290°. However, at the highest temperatures the impurity level of oxygen and carbon originating from the metal precursor ligand, is ∼5%. The growth rate dependence of temperature is divided into three different regions with large differences in activation energies, interpreted as different factors controlling the growth. The deposition rate as a function of precursor supply as well as the incubation time for the growth initiation are different at temperatures which are further indications of differences in reaction mechanism. By substitution of NH3 for H2 to the reactant gas the growth mechanism occurs via surface -NHx groups.

《Chemical vapour deposition of metastable Ni3N》 provides a strategy for the preparation of materials with excellent comprehensive properties, which is conducive to broaden the application field of this compound(Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II))SDS of cas: 14481-08-4.

Reference:
Ester – Wikipedia,
Ester – an overview | ScienceDirect Topics