Chemistry Milestones Of 14481-08-4

Compounds in my other articles are similar to this one(Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II))HPLC of Formula: 14481-08-4, you can compare them to see their pros and cons in some ways,such as convenient, effective and so on.

The three-dimensional configuration of the ester heterocycle is basically the same as that of the carbocycle. Compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II)(SMILESS: CC(C)(C1=O[Ni+2]2(O=C(C(C)(C)C)[CH-]1)O=C([CH-]C(C(C)(C)C)=O2)C(C)(C)C)C,cas:14481-08-4) is researched.Name: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II). The article 《Atomic/molecular layer deposition of Ni-terephthalate thin films》 in relation to this compound, is published in Dalton Transactions. Let’s take a look at the latest research on this compound (cas:14481-08-4).

Atomic/mol. layer deposition (ALD/MLD) is currently strongly emerging as an intriguing route for novel metal-organic thin-film materials. This approach already covers a variety of metal and organic components, and potential applications related to e.g. sustainable energy technologies. Among the 3d metal components, nickel has remained unexplored so far. Here the authors report a robust and efficient ALD/MLD process for the growth of high-quality nickel terephthalate thin films. The films are deposited from Ni(thd)2 (thd: 2,2,6,6-tetramethyl-3,5-heptanedionate) and terephthalic acid (1,4-benzenedicarboxylic acid) precursors in the temperature range of 180-280°C, with appreciably high growth rates up to 2.3 Å per cycle at 200°C. The films are amorphous but the local structure and chem. state of the films are addressed based on XRR, FTIR and RIXS techniques.

Compounds in my other articles are similar to this one(Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II))HPLC of Formula: 14481-08-4, you can compare them to see their pros and cons in some ways,such as convenient, effective and so on.

Reference:
Ester – Wikipedia,
Ester – an overview | ScienceDirect Topics