Nilsen, O.; Fjellvag, H.; Kjekshus, A. published an article about the compound: Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)nickel(II)( cas:14481-08-4,SMILESS:CC(C)(C1=O[Ni+2]2(O=C(C(C)(C)C)[CH-]1)O=C([CH-]C(C(C)(C)C)=O2)C(C)(C)C)C ).Computed Properties of C22H38NiO4. Aromatic heterocyclic compounds can be classified according to the number of heteroatoms or the size of the ring. The authors also want to convey more information about this compound (cas:14481-08-4) through the article.
The utility of precursors for at. layer CVD (ALCVD) growth is limited by the sublimation and decomposition temperatures Sublimation temperatures are conveniently obtained by TG under vacuum. The authors present here a relatively inexpensive method to obtain information about the decomposition temperature for a precursor candidate for ALCVD. This approach requires an oven with a controlled temperature gradient and a long ampul for each precursor. The precursors tested comprise the thd complexes (Hthd = 2,2,6,6-tetramethylheptane-3,5-dione) of V, Cr, Mn, Fe, Co, Ni, Cu, Zn, La, and Ca.
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